Nickel Carbide, Sputtering Target, 99.9%, 8 inch dia x 0.250 inch th.

Nickel carbide is utilized as a target material in sputtering processes to deposit hard, wear-resistant thin films and to incorporate carbon into nickel-based layers for modified magnetic and mechanical properties.

Ni3C nanoparticles are synthesized for use in catalysis and as precursors for carbon-encapsulated nickel nanostructures.