Nickel Manganese
Sputtering TargetChemical Name
Chemical Formula
Purity
99.95%
Composition
32/68 at% Ni:Mn
Size
75 mm dia x 3 mm th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPNIMN75D3T3N5
Hazmat
Catalog Number
11290
Description
Comments
Nickel Manganese alloy targets are used in sputtering processes to create thin films for magnetic sensors and electronic components.
Used as an alloying agent to improve the mechanical properties, corrosion resistance, and magnetic characteristics of specialized steel and non-ferrous alloys.
Nickel and manganese are critical precursors in the synthesis of lithium nickel manganese cobalt oxide (NMC) cathode materials for high-energy-density batteries.
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