Nickel Niobium Tantalum Alloy, Sputtering Target, 99.9%, 3 inch dia x 3 mm th.

Nickel Niobium Tantalum alloy targets are used in physical vapor deposition to create thin films with high corrosion resistance and thermal stability for microelectronic components.

Used as a master alloy to introduce niobium and tantalum into nickel-based superalloys to improve creep strength and high-temperature performance.

This alloy system is utilized in the development of materials capable of maintaining structural integrity and oxidation resistance in extreme thermal environments.