Nickel Niobium Zirconium Tantalum Alloy, Sputtering Target, 99.9%, 3 inch dia x 3 mm th.

Used as a sputtering target material to deposit amorphous metallic glass thin films with high thermal stability and corrosion resistance for microelectronic and protective coating applications.

Utilized as a complex multi-component alloy system to study the formation of bulk metallic glasses and high-entropy alloys with superior mechanical properties.

The inclusion of refractory elements like Tantalum and Niobium allows this alloy to maintain structural integrity and oxidation resistance in high-temperature environments.