Nickel Sulfide
Sputtering TargetChemical Name
Chemical Formula
Purity
99.9%
Composition
Size
2 inch dia x 0.125 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPNIS22D3T03N
Hazmat
Catalog Number
12923
Description
Comments
inred Fragile, requires bonding , Phase purity NiS2-95%, NiS-5% present in it
Nickel disulfide is utilized as a high-capacity cathode material in lithium-ion and lithium-sulfur batteries due to its high theoretical capacity and electrochemical stability.
Nickel disulfide targets are used in sputtering processes to deposit thin films for use in photovoltaic cells and electrochemical sensors.
NiS2 is synthesized as nanocrystals or nanowires for use in electrocatalysis, specifically for the hydrogen evolution reaction (HER) and oxygen evolution reaction (OER).
Loading COA files…