Nickel Silicon Alloy, Sputtering Target, 99.5%, 3 inch dia x 0.125 inch th.

Nickel disilicide is used as a contact material in silicon-based integrated circuits due to its low electrical resistivity and excellent lattice match with silicon substrates.

Nickel silicon alloy targets are utilized in physical vapor deposition processes to create thin film silicide layers for microelectronic gate electrodes and interconnects.