Nickel Titanium Copper Alloy
Sputtering TargetChemical Name
Chemical Formula
Purity
99.99%
Composition
42:51:7 at%
Size
2 inch dia x 0.25 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPNITICU2D6T4N
Hazmat
Catalog Number
5612
Description
Comments
NiTiCu alloy targets are used in magnetron sputtering to deposit shape memory alloy thin films for micro-electromechanical systems (MEMS) and actuator applications.
Copper is added to the binary NiTi system to reduce transformation hysteresis and improve the fatigue life of shape memory alloys used in medical and industrial components.
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