Nickel Vanadium Alloy, Sputtering Target, 99.95%, 14.875 inch x 4.75 inch x 0.250 inch th.

Nickel Vanadium alloy is widely used as a sputtering target material to create non-magnetic thin films in the production of semiconductors and electronic components.

Used in semiconductor fabrication as an under-bump metallization (UBM) layer to provide a diffusion barrier and adhesion layer between the chip and solder bumps.