Nickel Vanadium Alloy
Sputtering TargetNickel Vanadium Alloy, Sputtering Target, 99.95%, 8 inch dia x 0.125 inch th.
Tags: Sputtering
Product Specifications
Chemical Name
Chemical Formula
Purity
99.95%
Composition
93:7 wt%
Size
8 inch dia x 0.125 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPNIV8D3T03N5
Hazmat
Catalog Number
2161
Description
Comments
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Element Name
Nickel Vanadium Alloy
Symbol
NiV
Atomic Number
-
Atomic Weight
-
Melting Point
-
Boiling Point
-
Density
-
Crystal Structure
-
Color / Appearance
Metallic gray
Thermal Conductivity
-
Electrical Resistivity
-
Coefficient of Thermal Expansion
-
Electronegativity
-
Neutron Cross Section
-
Electron Configuration
-
This Product
SPNIV8D3T03N5
Form
Sputtering Target
Purity
99.95%
Composition
93:7 wt%
Size
8 inch dia x 0.125 inch th.
Quantity Available
pcs
Catalog Number
2161
info
Sputtering
Nickel Vanadium alloy is widely used as a sputtering target material to create non-magnetic thin films in the production of semiconductors and electronic components.
info
Semiconductors
Used in semiconductor fabrication as an under-bump metallization (UBM) layer to provide a diffusion barrier and adhesion layer between the chip and solder bumps.
warning
HazMat Classification
Not classified as hazardous material.
description
Documentation
Safety Data Sheet (SDS) and Certificate of Analysis (COA) available for download. GHS-compliant labeling provided with all shipments.
local_shipping
Shipping
Shipped via FedEx Ground or UPS. Hazmat surcharges apply. International orders may require export compliance review. Custom packaging available.
verified
Quality Assurance
All products supplied with lot-specific COA including ICP-OES elemental analysis, XRD phase identification, and particle size distribution data.
description
Certificates of Analysis (COA)
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