Nickel Vanadium Alloy
Sputtering TargetChemical Name
Chemical Formula
Purity
99.95%
Composition
93:7 wt%
Size
S-Gun ConMag
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPNIVCS0003N5-1
Hazmat
Catalog Number
5499
Description
Comments
Nickel Vanadium alloy is widely used as a sputtering target material to create non-magnetic thin films in the production of semiconductors and electronic components.
Used in semiconductor fabrication as an under-bump metallization (UBM) layer to provide a diffusion barrier and adhesion layer between the chip and solder bumps.
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