Nickel Tungsten Alloy
Sputtering TargetChemical Name
Chemical Formula
Purity
99.95%
Composition
50/50 at% Ni:W
Size
2 inch dia x 0.25 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPNIW3D6T03N5
Hazmat
Catalog Number
3955
Description
Comments
Nickel Tungsten alloy targets are used in physical vapor deposition to create thin films that provide high hardness, corrosion resistance, and magnetic properties for electronic components.
Used as an alloying agent to enhance the high-temperature strength, wear resistance, and mechanical properties of specialized steel and superalloys.
Utilized in thermal spray processes to apply protective coatings on industrial components requiring superior resistance to abrasion and chemical erosion.
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