Osmium, Sputtering Target, 99.95%, 3 inch dia x 3 mm th.

Osmium is used as a sputtering target material to create extremely hard, wear-resistant thin films and for coating specimens in scanning electron microscopy to provide high-resolution imaging.

Osmium is alloyed with other platinum group metals to produce exceptionally hard materials for use in fountain pen nibs, instrument pivots, and electrical contacts.

Due to its extremely high melting point and density, osmium is utilized in specialized high-temperature applications where resistance to mechanical wear and chemical corrosion is critical.