Palladium, Sputtering Target, 99.994%, 2 inch dia x 0.1250 inch th.

Palladium sputtering targets are used to create thin films for microelectronics, sensors, and decorative coatings due to its excellent corrosion resistance and catalytic properties.

Palladium is utilized as a high-purity evaporation source in physical vapor deposition processes to form conductive layers and contact points in electronic devices.

Palladium is frequently alloyed with other metals to improve corrosion resistance, hardness, and hydrogen permeability in specialized industrial components.

Palladium nanoparticles are synthesized for high-surface-area applications, particularly in advanced catalysis and hydrogen sensing technologies.