Palladium Nickel Alloy, Sputtering Target, 99.95%, 57 mm dia x 0.3 mm th.

Palladium Nickel alloy targets are used in physical vapor deposition to create thin films for electronic contacts, hydrogen sensors, and decorative coatings.

Used as a specialized alloying material to improve corrosion resistance and hardness in electrical contact applications and jewelry.

Utilized as a source material in thermal or e-beam evaporation processes to deposit conductive layers in microelectronic device fabrication.