Praseodymium Nickel Manganese Oxide, Sputtering Target, 99.9%, 2 inch dia x 5 mm th.

Pr2NiMnO6 targets are used in sputtering processes to deposit multiferroic thin films for research into magnetodielectric and spintronic devices.

Utilized in the development of advanced optoelectronic components due to its unique electronic structure and double perovskite magnetic properties.