Ruthenium Oxide, Sputtering Target, 99.95%, 4 inch dia x 0.25 inch th.

Ruthenium oxide is used as a sputtering target material to deposit conductive thin films in microelectronic applications, such as electrode layers for ferroelectric memory devices.

Used as a diffusion barrier and gate electrode material in CMOS technology due to its high thermal stability and low electrical resistivity.

Applied in the fabrication of transparent conducting films and as a component in electrochromic devices.