Silicon Aluminum Alloy, Sputtering Target, 99.99%, 3 inch dia x 0.250 inch th.

Silicon aluminum alloy targets are used in physical vapor deposition to create AlSi thin films for semiconductor metallization and barrier layers.

Used as a master alloy in the production of lightweight aluminum components to improve fluidity, reduce thermal expansion, and increase wear resistance.

Applied as a coating material via plasma or flame spray to provide corrosion resistance and thermal management in aerospace and automotive components.

Utilized in selective laser melting (SLM) and other additive manufacturing processes to produce complex, lightweight structural parts with high thermal stability.

Used as a source material in vacuum evaporation processes to deposit thin films for optical and electronic applications.