Samarium Oxide, Sputtering Target, 99.95%, 3 inch dia x 0.125 inch th.

Used as a specialized reagent in the production of samarium metal and as a catalyst for the dehydration and dehydrogenation of organic compounds.

Utilized in the manufacture of infrared-absorbing glass and as a dopant in calcium fluoride crystals for optical lasers.

Fabricated into high-purity sputtering targets for the deposition of dielectric thin films in electronic and magnetic storage devices.

Applied as a thin film coating to provide specific refractive index properties and infrared absorption in precision optical components.

Used as a source material in vacuum evaporation processes to create protective or functional layers on substrates.