Samarium Nickel Oxide, Sputtering Target, 99.9%, 2 inch dia x 0.125 inch th.

Samarium Nickel Oxide is used as a sputtering target material to create thin films for studying metal-insulator transitions and developing neuromorphic computing devices.

Utilized in semiconductor research for its unique phase-change properties, specifically the sharp metal-to-insulator transition (MIT) triggered by temperature or voltage.

Applied in optoelectronic devices where its tunable refractive index and absorption properties can be controlled via the material's electronic phase state.