Tin, Sputtering Target, 99.999%, 8 inch dia x 4 mm th.

Tin is used as a sputtering target material to create thin films for transparent conductive oxides (TCOs), such as Indium Tin Oxide (ITO), and for protective or decorative coatings.

Tin is utilized as a high-purity evaporation source in physical vapor deposition processes to form thin metallic layers or as a component in alloyed films.

Tin is a critical alloying element used to produce bronze, pewter, and specialized solder alloys for electronics and industrial manufacturing.

Tin-based materials and tin oxides are researched and utilized as high-capacity anode materials for lithium-ion batteries due to their ability to alloy with lithium.

Tin is used as a dopant in various semiconductor materials and is a key component in compound semiconductors like Tin Sulfide (SnS) for photovoltaic applications.