Tin Oxide, Sputtering Target, 99.99%, 1 inch dia x 0.125 inch th.

Tin oxide is used as a precursor material in the fabrication of sputtering targets for the deposition of thin-film p-type semiconductors and transparent conducting oxides.

Tin(II) oxide acts as a p-type semiconductor material used in the development of thin-film transistors and gas sensors.

SnO is utilized as an evaporation source for creating thin layers in optical and electronic coating processes.