Tin Oxide, Sputtering Target, 99.95%, 3 inch dia x 0.125 inch th.

Tin oxide is used as a sputtering target material to create transparent conductive oxide (TCO) thin films for touchscreens and solar cells.

Utilized in optoelectronic devices as a wide-bandgap semiconductor for transparent electrodes and gas sensors.

Applied as a high-refractive index layer in multilayer optical coatings to control reflection and transmission properties.

Used as a source material in physical vapor deposition processes to deposit thin protective or functional oxide layers.

Produced in nanocrystalline form for high-surface-area applications such as advanced catalysis and sensitive chemical detection.