Tin Oxide-Antimony Oxide
Sputtering TargetChemical Name
Chemical Formula
Purity
99.99%
Composition
SnO2:Sb2O3 (96/4wt%)
Size
700 mm x 123 mm x 10 mm th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPSNO2SB2O3700123104N-1
Hazmat
Catalog Number
7752
Description
Comments
RD~80%
ATO is used as a sputtering target material to deposit transparent conductive oxide (TCO) thin films that provide antistatic properties and infrared shielding.
Used in the fabrication of transparent electrodes and optoelectronic devices where high visible light transmission and electrical conductivity are required.
Produced as nanopowders or dispersions for use in conductive coatings, heat-shielding masterbatches, and functional textile treatments.
Applied as a thin film coating to glass or plastic substrates to provide solar heat control and UV protection while maintaining transparency.
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