Tin Oxide-Tantalum
Sputtering TargetChemical Name
Chemical Formula
Purity
99.99%
Composition
(93/7 wt% SnO2:Ta)
Size
2 inch dia x 0.25 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPSNO2TA2D6T4N-1
Hazmat
Catalog Number
9048
Description
Comments
Tantalum-doped tin oxide is used as a sputtering target material to deposit transparent conductive oxide (TCO) thin films with high electrical conductivity and optical transparency.
Used in the fabrication of transparent electrodes for solar cells, touch screens, and organic light-emitting diodes (OLEDs) as an alternative to Indium Tin Oxide.
Acts as an n-type degenerate semiconductor material for thin-film transistor applications and gas sensing devices.
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