Tin Oxide-Bismuth, Sputtering Target, 99.99%, 2 inch dia x 5.3 mm th.

Tin oxide doped with bismuth is utilized as a sputtering target material to create transparent conductive oxide (TCO) thin films with modified electrical and optical properties.

Bismuth-doped tin oxide films are employed in optoelectronic devices where high transparency and specific work functions are required for electrode layers.

Used as an n-type semiconductor material where bismuth doping levels are adjusted to tune the carrier concentration and bandgap for electronic components.