Tin Oxide-Tungsten Oxide
Sputtering TargetChemical Name
Chemical Formula
Purity
99.99%
Composition
96.25:3.75 wt%
Size
2 inch dia x 0.250 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPSNWO2D6T04N
Hazmat
Catalog Number
4852
Description
Comments
Tin Oxide-Tungsten Oxide composite targets are used in magnetron sputtering to deposit thin films for gas sensing applications and electrochromic devices.
This mixed oxide system acts as an n-type semiconductor material utilized in the fabrication of sensitive and selective solid-state gas sensors for detecting volatile organic compounds.
Synthesized in nanostructured forms such as nanowires or nanopowders to enhance the surface-to-volume ratio for improved catalytic and sensing performance.
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