Calcium and Niobium doped Strontium titanate, Sputtering Target, 99.9%, 20 mm dia x 4 mm th.

Used as a ceramic target material for the deposition of conductive or semiconductive thin films in electronic and energy research applications.

Niobium doping introduces n-type conductivity into the strontium titanate lattice, making it suitable for use as a semiconducting substrate or active layer in oxide electronics.

Investigated for use in high-temperature thermoelectric power generation due to its structural stability and tunable electrical transport properties at elevated temperatures.