Strontium Iron Oxide, Sputtering Target, 99.9%, 2 inch dia x 0.25 inch th.

Strontium Iron Oxide is utilized as a ceramic sputtering target material for the deposition of thin films in the study of multiferroic properties and oxygen-deficient perovskite structures.

Used in the fabrication of thin-film devices where the tunable oxidation states of iron allow for the modulation of optical and electronic properties.