Strontium Niobium Oxide, Sputtering Target, 99.95%, 3 inch dia x 3.175 mm th.

Strontium Niobium Oxide is used as a sputtering target material to deposit conductive oxide thin films for electronic and optical device fabrication.

Utilized in the development of transparent conducting oxides (TCOs) and plasmonic devices due to its high carrier concentration and metallic conductivity.

Acts as a conductive buffer layer or electrode material in epitaxial heterostructures for advanced semiconductor devices.