Tantalum aluminum Alloy, Sputtering Target, 99.9%, 6 inch dia x 0.25 inch th.

Tantalum aluminum alloy targets are used in physical vapor deposition to create thin films for resistor networks and barrier layers in integrated circuits.

Used as an additive in the production of superalloys to improve high-temperature strength and oxidation resistance.

Utilized in high-temperature environments due to its high melting point and structural stability under thermal stress.