Chemical Name
Tantalum aluminum Alloy
Chemical Formula
TaAl
Purity
99.9%
Composition
Size
6 inch dia x 0.25 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPTAAL6D6T03N
Hazmat
Catalog Number
838
Description
Comments
Tantalum aluminum alloy targets are used in physical vapor deposition to create thin films for resistor networks and barrier layers in integrated circuits.
Used as an additive in the production of superalloys to improve high-temperature strength and oxidation resistance.
Utilized in high-temperature environments due to its high melting point and structural stability under thermal stress.
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