Tantalum Hafnium Carbide, Sputtering Target, 99.5%, 6 inch dia x 0.25 inch th.

Tantalum hafnium carbide is utilized as a high-performance refractory material due to its status as one of the compounds with the highest known melting points, suitable for extreme thermal environments.

Used in the fabrication of components for aerospace and defense that must maintain structural integrity at temperatures exceeding 3500 °C.

Used as a target material in physical vapor deposition to create ultra-high temperature ceramic coatings on turbine blades and engine components.