Tantalum Sulfide
Sputtering TargetChemical Name
Chemical Formula
Purity
99.95%
Composition
Size
4 inch dia x 0.25 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
12143-72-5
Status
Product ID
SPTAS24D6T3N5
Hazmat
Catalog Number
155
Description
Comments
Tantalum sulfide is used as a sputtering target material for the deposition of transition metal dichalcogenide (TMDC) thin films in electronic and lubricating applications.
As a transition metal dichalcogenide, TaS2 is researched for its charge density wave properties and potential integration into next-generation 2D semiconductor devices.
TaS2 is utilized in the synthesis of two-dimensional nanosheets and nanotubes for exploring quantum phenomena and high-performance electrochemical sensing.
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