Chemical Name
Tantalum silicon
Chemical Formula
Ta/Si
Purity
99.95%
Composition
70:30 wt%
Size
12.982 inch dia x 0.35 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPTASI12D0T3N5-1
Hazmat
Powder: Hazmat UN3089
Catalog Number
6043
Description
Comments
AMAT Backing plate available
Tantalum-silicon composite targets are used in magnetron sputtering to deposit thin films for diffusion barriers and gate electrodes in integrated circuit fabrication.
Used in the semiconductor industry to create tantalum silicide (TaSi2) layers which serve as low-resistivity interconnects and ohmic contacts.
Tantalum-silicon mixtures are utilized as source materials in physical vapor deposition processes to create protective and functional silicide coatings.
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