Tantalum Telluride
Sputtering TargetChemical Name
Chemical Formula
Purity
99.99%
Composition
Size
4 inch dia x 0.25 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
12067-66-2
Status
Product ID
SPTATE24D6T4N
Hazmat
Catalog Number
156
Description
Comments
* in production
Tantalum telluride is used as a sputtering target material for the deposition of transition metal dichalcogenide (TMDC) thin films in electronic and optoelectronic research.
As a layered transition metal dichalcogenide, TaTe2 is studied for its charge density wave properties and potential integration into next-generation semiconductor devices.
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