Tantalum Tungsten, Sputtering Target, 99.95%, 3 inch dia x 0.25 inch th.

Tantalum-tungsten alloys are used as sputtering targets to deposit thin films that serve as diffusion barriers and corrosion-resistant layers in microelectronic circuits.

Tantalum is alloyed with tungsten to significantly increase the tensile strength and creep resistance of the base metal for use in aerospace and chemical processing equipment.

TaW alloys are utilized in high-temperature environments such as rocket engine nozzles and heat exchangers due to their high melting points and structural stability.