Terbium Scandate, Sputtering Target, 99.9%, 12 inch dia x 0.125 inch th.

Terbium Scandate is used as a sputtering target material to deposit high-k dielectric thin films and specialized buffer layers in advanced electronic and magnetic heterostructures.

Used as a substrate material for the epitaxial growth of ferroelectric and multiferroic thin films due to its specific lattice matching properties.

Utilized as a high-quality single crystal substrate for research into rare-earth doped materials and complex oxide interfaces.