Tellurium (IV) Oxide, Sputtering Target, 99.99%, 4 inch dia x 0.125 inch th.

Tellurium (IV) oxide is used as a sputtering target material to create thin films for acousto-optic devices and optical storage media.

Used in the production of high-refractive index layers and specialized glass coatings due to its excellent transparency in the infrared spectrum.

TeO2 is utilized as an evaporation source for depositing thin films in the fabrication of sensors and optical waveguides.

Applied in the manufacturing of acousto-optic deflectors and modulators because of its high photoelastic constant and low acoustic velocity.