Titanium Niobium, Sputtering Target, 99.9%, 3 inch dia x 0.125 inch th.

Titanium Niobium alloy targets are used in magnetron sputtering to deposit thin films that provide high refractive indices and corrosion resistance in optical and microelectronic coatings.

Used as an alloying agent to enhance the mechanical properties, biocompatibility, and superconducting characteristics of specialized titanium-based alloys.

Applied in semiconductor manufacturing as a diffusion barrier material or as part of the gate electrode stack in advanced integrated circuits.