Titanium Oxide, Sputtering Target, 99.95%, 4 inch dia x 0.125 inch th.

Titanium(III) oxide is used as a sputtering target material for the deposition of oxygen-deficient titanium oxide thin films in optical and electronic applications.

Ti2O3 exhibits a metal-insulator transition, making it a material of interest for research into semiconductor-to-metal phase changes and thin-film transistor components.

Used as a starting material for vacuum deposition to create high-refractive index layers in multilayer optical coatings.