Titanium Oxide, Sputtering Target, 99.9%, 3 inch dia x 0.125 inch th.

Ti3O5 is widely used as a starting material for the vacuum deposition of thin films because it evaporates congruently, providing stable deposition rates and consistent refractive indices for optical coatings.

Used to create high-refractive index layers in multilayer interference filters, anti-reflective coatings, and beam splitters due to its excellent transparency in the visible and near-infrared spectrum.

Utilized as a target material in physical vapor deposition processes to create durable, high-index titanium oxide thin films on glass and plastic substrates.