Titanium Tin Carbide, Sputtering Target, 99.9%, 4 inch dia x 3 mm th.

Titanium tin carbide is utilized as a sputtering target material for the deposition of MAX phase thin films, which provide a combination of metallic and ceramic properties for wear-resistant and conductive coatings.

As a member of the MAX phase family, Ti3SnC2 exhibits excellent thermal shock resistance and maintains mechanical stability at elevated temperatures, making it suitable for high-temperature structural components.