Titanium(III) fluoride, Sputtering Target, 99.9%, 2.5 inch dia x 5 mm th.

Titanium(III) fluoride is used as a precursor material in the preparation of fluoride-based thin films via sputtering processes for specialized optical and protective coatings.

Utilized in the deposition of thin films to modify refractive index and enhance durability in multi-layer optical interference filters.