Titanium Aluminum Nitride, Sputtering Target, 99.5%, 2 inch dia x 0.125 inch th.

Titanium Aluminum Nitride is used as a high-performance sputtering target material to deposit hard, wear-resistant thin films on cutting tools and mechanical components to improve thermal stability and oxidation resistance.

Used in the deposition of specialized optical thin films where high hardness and specific refractive indices are required for protective or decorative coatings.