Titanium (Nb doped), Sputtering Target, 99.9%, 4 inch dia x 0.25 inch th.

Niobium-doped titanium targets are used in magnetron sputtering to deposit conductive thin films with high refractive indices, often utilized in the manufacturing of smart windows and optical coatings.

TiNb oxide layers produced via evaporation or sputtering provide high-index layers for interference filters and anti-reflective coatings.

Niobium-doped titanium materials are investigated for use in transparent conducting oxides (TCOs) as an alternative to ITO in semiconductor device fabrication.