Titanium Chromium Nitride
Sputtering TargetChemical Name
Chemical Formula
Purity
99.5%
Composition
TiN:CrN (50:50at%)
Size
2 inch dia x 0.125 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
Status
Product ID
SPTINCRN2D3T2N5
Hazmat
Catalog Number
20010
Description
Comments
Titanium Chromium Nitride is used as a sputtering target material to deposit hard, wear-resistant thin films on cutting tools and mechanical components to improve oxidation resistance and hardness.
Used in thermal spray processes to create protective coatings that offer superior high-temperature stability and corrosion resistance compared to binary nitride coatings.
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