Titanium Oxide, Sputtering Target, 99.95%, 57 mm dia x 0.0625 inch th.

Titanium oxide is used as a sputtering target material to deposit high-refractive index thin films for optical and protective coatings.

TiO2 is a standard high-index material used in multilayer interference filters, anti-reflective coatings, and beam splitters due to its high refractive index and transparency in the visible and near-infrared spectrum.

Titanium dioxide is frequently used as an evaporation source in physical vapor deposition processes to create durable, high-refractive index optical layers.

Nanostructured TiO2 is utilized in photocatalysis, self-cleaning surfaces, and advanced sensors due to its high surface area and unique electronic properties at the nanoscale.

TiO2 polymorphs, particularly anatase and TiO2-B, are investigated as safe, high-rate anode materials for lithium-ion batteries due to their structural stability during cycling.