Titanium Monoxide, Sputtering Target, 99.9%, 3 inch dia x 0.25 inch th.

Titanium monoxide is used as a sputtering target material to deposit thin films for optical coatings and microelectronic components where specific oxygen stoichiometry is required.

Used in vacuum deposition processes to create thin films with high refractive indices for anti-reflective coatings and multilayer interference filters.

TiO is utilized as a source material in physical vapor deposition (PVD) to produce uniform titanium oxide layers with controlled oxidation states.