Titanium Oxide - Tantalum, Sputtering Target, 99.95%, 2 inch dia x 0.125 inch th.

Titanium oxide doped with tantalum is used as a sputtering target material to create high-refractive index thin films with enhanced electrical conductivity for transparent conducting oxide (TCO) applications.

Used in the deposition of multilayer optical coatings where a specific refractive index and high durability are required for interference filters and anti-reflective surfaces.

This composite material serves as a specialized evaporation source for vacuum deposition processes to produce tantalum-doped titania layers.