Titanium Suboxide, Sputtering Target, 99.95%, 3 inch dia x 0.125 inch th.

Titanium suboxide is used as a sputtering target material to create thin films with specific refractive indices and high electrical conductivity for optical and electronic coatings.

Used in vacuum deposition processes to create multilayer interference filters and anti-reflective coatings due to its high refractive index and absorption properties.

Titanium suboxide (often as Ti4O7 or Ti2O3) is preferred over TiO2 in e-beam evaporation because it melts more uniformly and prevents 'spitting' during the deposition process.

Utilized as a source material in electron beam evaporation to deposit durable, high-index optical thin films.