Chemical Name
Titanium Silicide
Chemical Formula
TiSi
Purity
99.95%
Composition
Size
6 inch dia x 0.25 inch th.
EINECS Number
Quantity Available
pcs
CAS Number
12039-70-2
Status
Product ID
SPTISI6D6T3N5
Hazmat
Catalog Number
3605
Description
Comments
RD~70%
Titanium silicide is used as a sputtering target material to create thin-film silicide layers for ohmic contacts and gate electrodes in microelectronic devices.
Used in the fabrication of integrated circuits to form low-resistivity interconnects and stable metal-semiconductor interfaces.
Utilized for its high melting point and chemical stability in high-temperature environments and protective coatings.
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